![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Polymer structure modifications for immersion leaching and watermark control
Lee, Jae Woo, Lin, Qinghuang, Oh, Seung Keun, Kim, Jung Woo, Lee, Sang Hyang, Jeong, Young Ho, Kim, Sang Soo, Park, Myoung Hwan, Kim, Deogbae, Kim, Jaehyun, Lee, Geunsu, Moon, Seung-ChanVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655477
File:
PDF, 859 KB
english, 2006