SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Immersion topcoat and resist material improvement study by using immersion scanner
Nakagawa, Hiroki, Lin, Qinghuang, Hoshiko, Kenji, Shima, Motoyuki, Kusumoto, Shiro, Shimokawa, Tsutomu, Nakano, Katsushi, Fujiwara, Tomoharu, Owa, SoichiVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655541
File:
PDF, 463 KB
english, 2006