SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Product and tool control using integrated auto-macro defect inspection in the photolithography cluster
Menon, Vinayan C., Archie, Chas N., Isaacson, Robert L., Nicholls, Matthew C., Lickteig, Stephen J., Forstner, Thomas, Barnett, Anthony R., Mulhall, JamesVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656394
File:
PDF, 953 KB
english, 2006