![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - In-field CD uniformity control by altering transmission distribution of the photomask using ultra-fast pulsed laser technology
Morikawa, Yasutaka, Hoga, Morihisa, Sutou, Takanori, Inazuki, Yuichi, Adachi, Takashi, Yoshida, Yuuichi, Kojima, Kouichirou, Sasaki, Shiho, Mohri, Hiroshi, Hayashi, Naoya, Dmitriev, Vladimir, OshemkovVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681762
File:
PDF, 265 KB
english, 2006