SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - New inline AFM metrology tool suited for LSI manufacturing at the 45-nm node and beyond
Edamura, Manabu, Archie, Chas N., Kunitomo, Yuichi, Morimoto, Takafumi, Sekino, Satoshi, Kurenuma, Toru, Kembo, Yukio, Watanabe, Masahiro, Baba, Shuichi, Hidaka, KishioVolume:
6518
Year:
2007
Language:
english
DOI:
10.1117/12.711676
File:
PDF, 629 KB
english, 2007