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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - A study of imprint-specific defects in the step and flash imprint lithography process
Perez, J., Lercel, Michael J., Selinidis, K., Johnson, S., Fletcher, B., Xu, F., Maltabes, J., McMackin, I., Resnick, D., Sreenivasan, S. V.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.720673
File:
PDF, 603 KB
english, 2007