SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA...

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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Comparing traditional OPC to field-based OPC for 45-nm node production

Farnbach, Rick, Flagello, Donis G., Tuttle, Josh, St. John, Matt, Brown, Randy, Gerold, Dave, Lucas, Kevin, Lugg, Robert, Shiely, James, Rieger, Mike
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Volume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.721593
File:
PDF, 1.03 MB
english, 2007
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