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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
Seo, KangJoon, Lee, SangIee, Kim, HyunYoung, Hwang, DaeHo, Kim, Sangpyo, Jeong, Goomin, Han, Oscar, Chen, Chunlin, Yee, David, Kim, EunJi, Park, KiHun, Kim, NamWook, Choi, Sunny, Kim, David, Lohokare,Volume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728996
File:
PDF, 845 KB
english, 2007