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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - A lithography aware design optimization using foundry-certified models and hotspot detection
Karklin, L., Naber, Robert J., Kawahira, Hiroichi, Arkhipov, A., Blakely, D., Dingenen, M., Mehrotra, A., Watson, B., Zelnik, C., Cote, M., Hurat, P.Volume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.747306
File:
PDF, 362 KB
english, 2007