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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Extended Nijboer-Zernike (ENZ) based mask imaging: efficient coupling of electromagnetic field solvers and the ENZ imaging algorithm
Janssen, Olaf T. A., van Haver, Sven, Janssen, Augustus J. E. M., Braat, Joseph J. M., Urbach, H. Paul, Pereira, Silvania F.Volume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.772497
File:
PDF, 850 KB
english, 2008