SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Impact of HBr and Ar cure plasma treatments on 193nm photoresists
Henderson, Clifford L., Bazin, Arnaud, Pargon, Erwine, Mellhaoui, Xavier, Perret, Damien, Mortini, Bénédicte, Joubert, OlivierVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.772573
File:
PDF, 364 KB
english, 2008