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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Separable OPC models for computational lithography
Liu, Hua-Yu, Horiuchi, Toshiyuki, Zhao, Qian, Chen, J. Fung, Jiang, Jiong, Socha, Robert, Van Setten, Eelco, Engelen, Andre, Meessen, Jeroen, Crouse, Michael M., Feng, Mu, Shao, Wenjin, Cao, Hua, Cao,Volume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793039
File:
PDF, 1.16 MB
english, 2008