SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Optimization of mask absorber stacks and illumination settings for contact hole imaging
Erdmann, Andreas, Horiuchi, Toshiyuki, Fühner, Tim, Evanschitzky, PeterVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793128
File:
PDF, 3.29 MB
english, 2008