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SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - High resolution patterning and simulation on Mo/Si multilayer for EUV masks
Tsikrikas, N., Patsis, G. P., Raptis, I., Gerardino, A.Volume:
6792
Year:
2008
Language:
english
DOI:
10.1117/12.798804
File:
PDF, 253 KB
english, 2008