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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Double dipole RET investigation for 32 nm metal layers
Babcock, Carl, Kawahira, Hiroichi, Zurbrick, Larry S., Zou, Yi, Dunn, Derren, Baum, Zachary, Zhao, Zengqin, Matthew, Itty, LaCour, PatVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801789
File:
PDF, 875 KB
english, 2008