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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Polymer dissolution model: an energy adaptation of the critical ionization theory
Chauhan, Siddharth, Henderson, Clifford L., Somervell, Mark, Scheer, Steven, Mack, Chris A., Bonnecaze, Roger T., Willson, C. GrantVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814344
File:
PDF, 332 KB
english, 2009