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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Exploration of linear and non-linear double exposure techniques by simulation
Petersen, John S., Levinson, Harry J., Dusa, Mircea V., Greenway, Robert T., Fühner, Tim, Evanschitzky, Peter, Shao, Feng, Erdmann, AndreasVolume:
7274
Year:
2009
DOI:
10.1117/12.814411
File:
PDF, 1010 KB
2009