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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning
Hunsche, Stefan, Levinson, Harry J., Dusa, Mircea V., Zhao, Qian, Xie, Xu, Socha, Robert, Liu, Hua-Yu, Nikolsky, Peter, Ngai, Anthony, van Adrichem, Paul, Crouse, Michael, Lalovic, IvanVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814644
File:
PDF, 291 KB
english, 2009