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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - High-resolution e-beam repair for nanoimprint templates
Pritschow, Marcus, Zurbrick, Larry S., Montgomery, M. Warren, Dobberstein, Harald, Edinger, Klaus, Irmscher, Mathias, Resnick, Douglas J., Selinidis, Kosta, Thompson, Ecron, Waiblinger, MarkusVolume:
7488
Year:
2009
Language:
english
DOI:
10.1117/12.833030
File:
PDF, 1006 KB
english, 2009