SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Regularization of inverse photomask synthesis to enhance manufacturability
Chen, Alek C., Jia, Ningning, Wong, Alfred K., Han, Woo-Sung, Lin, Burn J., Lam, Edmund Y., Yen, AnthonyVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837512
File:
PDF, 627 KB
english, 2009