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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Effect of bandwidth and numerical aperture in optical scatterometry
Germer, Thomas A., Raymond, Christopher J., Patrick, Heather J.Volume:
7638
Year:
2010
Language:
english
DOI:
10.1117/12.846776
File:
PDF, 283 KB
english, 2010