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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Advanced patterning solutions based on the "shrink process assisted by double exposure" (SPADE)
Bae, Young C., Allen, Robert D., Liu, Yi, Cardolaccia, Thomas, Bell, Rosemary, Spizuoco, Ken, Barclay, George G.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.848047
File:
PDF, 3.69 MB
english, 2010