SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Defect reduction of patterned media templates and disks
Luo, Kang, Hosono, Kunihiro, Ha, Steven, Fretwell, John, Ramos, Rick, Ye, Zhengmao, Schmid, Gerard, LaBrake, Dwayne, Resnick, Douglas J., Sreenivasan, S. V.Volume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.866882
File:
PDF, 4.66 MB
english, 2010