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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Accelerating litho technology development for advanced design node flash memory FEOL by next-generation wafer inspection and SEM review platforms
Lee, Byoung Ho, Ahn, Jeongho, Ihm, Dongchul, Chin, Soobok, Lee, Dong-Ryul, Choi, Seongchae, Lee, Junbum, Kang, Ho-Kyu, Sivaraman, Gangadharan, Yamamoto, Tetsuya, Lakhawat, Rahul, Sanapala, Ravikumar,Volume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.916505
File:
PDF, 2.66 MB
english, 2012