SPIE Proceedings [SPIE 1983 Microlithography Conferences - Santa Clara (Monday 14 March 1983)] Optical Microlithography II: Technology for the 1980s - Germanium-Selenium (Ge-Se) Based Resist Systems For Submicron VLSI Application
Ong, E., Tai, K. L., Vadimsky, R. G., Kemmerer, c. T., Stover, Harry L.Volume:
394
Year:
1983
Language:
english
DOI:
10.1117/12.935120
File:
PDF, 15.99 MB
english, 1983