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SPIE Proceedings [SPIE Microelectronic Processing '93 - Monterey, CA (Sunday 26 September 1993)] Microelectronic Processes, Sensors, and Controls - First-wafer effect on ellipsometer metrics and spatial etch pattern of polysilicon gate etch
Butler, Stephanie W., Stefani, Jerry A., Bondur, James A., Elliott, Kiefer, Hauser, John R., Kwong, Dim-Lee, Ray, Asit K.Volume:
2091
Year:
1994
Language:
english
DOI:
10.1117/12.167359
File:
PDF, 959 KB
english, 1994