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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - The novel solution for negative impact of out-of-band and outgassing by top coat materials in EUVL
Fujitani, Noriaki, Sakamoto, Rikimaru, Endo, Takafumi, Onishi, Ryuji, Nishita, Tokio, Yaguchi, Hiroaki, Ho, Bang-Ching, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011489
File:
PDF, 3.99 MB
english, 2013