SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - "Smart" source, mask, and target co-optimization to improve design related lithographically weak spots
Sturtevant, John L., Capodieci, Luigi, Chung, No-Young, Kang, Pil-Soo, Bang, Na-Rae, Kim, Jong-Du, Lee, Suk-Ju, Choi, Byung-Il, Choi, Bong-Ryoul, Park, Sung-Woon, Baik, Ki-Ho, Hsu, Stephen, Howell, RaVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2047077
File:
PDF, 398 KB
english, 2014