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SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Monday 14 April 2014)] Optical Micro- and Nanometrology V - Advanced metrology for the 14 nm node double patterning lithography
Gorecki, Christophe, Asundi, Anand K., Osten, Wolfgang, Carau, D., Bouyssou, R., Dezauzier, C., Besacier, M., Gourgon, C.Volume:
9132
Year:
2014
Language:
english
DOI:
10.1117/12.2051480
File:
PDF, 969 KB
english, 2014