![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advanced Etch Technology for Nanopatterning V - Evaluation of ALE processes for patterning
Lin, Qinghuang, Engelmann, Sebastian U., Papalia, J. M., Marchack, N., Bruce, R. L., Miyazoe, H., Engelmann, S. U., Joseph, E. A.Volume:
9782
Year:
2016
Language:
english
DOI:
10.1117/12.2219280
File:
PDF, 988 KB
english, 2016