SPIE Proceedings [SPIE Lasers, Optics, and Vision for Productivity in Manufacturing I - Besancon, France (Monday 10 June 1996)] Micro-Optical Technologies for Measurement, Sensors, and Microsystems - One-level gray-tone lithography: mask data preparation and pattern transfer
Reimer, Klaus, Quenzer, Hans Joachim, Demmeler, Rita, Wagner, Bernd, Parriaux, Olivier M.Volume:
2783
Year:
1996
Language:
english
DOI:
10.1117/12.248506
File:
PDF, 806 KB
english, 1996