![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Manufacturing Yield, Reliability, and Failure Analysis III - Arc-induced gate oxide breakdown in plasma etching process
Song, Jungwoo, Lee, Heegee, Lee, Jung Hoon, Keshavarzi, Ali, Prasad, Sharad, Hartmann, Hans-DieterVolume:
3216
Year:
1997
Language:
english
DOI:
10.1117/12.284697
File:
PDF, 349 KB
english, 1997