SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - Extension of the traditional optical model for investigation into EUV projection lithography capabilities
Ivin, Vladimir V., Lucas, Kevin D., Makhviladze, Tariel M., Manuylov, Vadim V., Medvedeva, Marina G., Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309628
File:
PDF, 875 KB
english, 1998