SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Optimization of 193-nm single-layer resists through statistical design
Gabor, Allen H., Dimov, Ognian N., Medina, Arturo N., Neisser, Mark O., Slater, Sydney G., Wang, Ruey H., Houlihan, Francis M., Cirelli, Raymond A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L.Volume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350205
File:
PDF, 1.82 MB
english, 1999