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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Positive ArF resist with 2EAdMA/GBLMA resin system
Uetani, Yasunori, Fujishima, Hiroaki, Araki, Kaoru, Endo, Kazuhisa, Takemoto, Ichiki, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350233
File:
PDF, 1.52 MB
english, 1999