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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Modal analysis of the SCALPEL mask using experimental and numerical methods
Semke, William H., Schlax, Michael P., Engelstad, Roxann L., Lovell, Edward G., Liddle, James A., Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351129
File:
PDF, 5.51 MB
english, 1999