SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Application of the hybrid finite-difference time-domain method to modeling curved surfaces in three-dimensional lithography simulation
Yeung, Michael S., Barouch, Eytan, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354316
File:
PDF, 816 KB
english, 1999