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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Understanding the impact of full-field mask error factor
Conley, Will, Shi, Xuelong, Hankinson, Matt, Dusa, Mircea V., Socha, Robert J., Garza, Cesar, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389047
File:
PDF, 1.98 MB
english, 2000