SPIE Proceedings [SPIE Microelectronic Manufacturing -...

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SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Feasibility of very low k1(=0.31) KrF lithography

Kim, Insung, Kim, Byeongsoo, Lee, Junghyun, Cho, Hanku, Moon, Joo-Tae, Burnett, David, Kimura, Shin'ichiro, Singh, Bhanwar
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Volume:
4181
Year:
2000
Language:
english
DOI:
10.1117/12.395744
File:
PDF, 609 KB
english, 2000
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