![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Challenges in Process Integration and Device Technology - Feasibility of very low k1(=0.31) KrF lithography
Kim, Insung, Kim, Byeongsoo, Lee, Junghyun, Cho, Hanku, Moon, Joo-Tae, Burnett, David, Kimura, Shin'ichiro, Singh, BhanwarVolume:
4181
Year:
2000
Language:
english
DOI:
10.1117/12.395744
File:
PDF, 609 KB
english, 2000