SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Defect printability analysis on electron projection lithography with diamond stencil reticle
Tomo, Yoichi, Kojima, Yoshinori, Shimizu, Sumito, Watanabe, Manabu, Takenaka, Hiroshi, Yamashita, Hiroshi, Iwasaki, Teruo, Takahashi, Kimitoshi, Yamabe, Masaki, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472351
File:
PDF, 2.29 MB
english, 2002