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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Linear alignment correction algorithm for deep-submicron lithography
Ziger, David H., Leroux, Pierre, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473434
File:
PDF, 856 KB
english, 2002