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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Introduction of full-level alternating phase-shift mask technology into IC manufacturing
Thiele, Joerg, Ahrens, Marco, Dettmann, Wolfgang, Heissmeier, M., Hennig, Mario, Ludwig, Burkhard, Moukara, Molela, Pforr, Rainer, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474639
File:
PDF, 1.44 MB
english, 2002