SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Strategy for sub-80-nm contact hole patterning considering device fabrication
Yoon, Jin-Young, Sturtevant, John L., Hata, Mitsuhiro, Hah, Jung-Hwan, Kim, Hyun-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-SungVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.534811
File:
PDF, 389 KB
english, 2004