SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Effect of reduction ratio on polarization impact for imaging
Gordon, Ronald L., Smith, Bruce W., Brunner, Timothy A., Seong, Nakgeuon, Lercel, Michael J., Gallatin, Gregg M.Volume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.544241
File:
PDF, 554 KB
english, 2004