SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics
Oshino, Tetsuya, Mackay, R. Scott, Yamamoto, Takahiro, Miyoshi, Tatsuro, Shiraishi, Masayuki, Komiya, Takaharu, Kandaka, Noriaki, Kondo, Hiroyuki, Mashima, Kiyoto, Nomura, Kazushi, Murakami, KatsuhikoVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.562365
File:
PDF, 350 KB
english, 2004