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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Development of nanocomposite resists with high plasma etch resistance
Chen, Chunwei, Lin, Qinghuang, Zhuang, Hong, Lu, Ping-Hung, Neisser, Mark, Pawlowski, GeorgVolume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.711601
File:
PDF, 1.09 MB
english, 2007