![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Flare evaluation for 32-nm half pitch using SFET
Aoyama, Hajime, Schellenberg, Frank M., Tanaka, Yuusuke, Kamo, Takashi, Iriki, Nobuyuki, Arisawa, Yukiyasu, Tanaka, ToshihikoVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.771857
File:
PDF, 1.07 MB
english, 2008