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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Imaging performance of the EUV alpha semo tool at IMEC
Lorusso, G. F., Schellenberg, Frank M., Hermans, J., Goethals, A. M., Baudemprez, B., Van Roey, F., Myers, A. M., Kim, I., Kim, B. S., Jonckheere, R. M., Niroomand, A., Lok, S., Van Dijk, A., de MarneVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.771983
File:
PDF, 1.37 MB
english, 2008