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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Double patterning overlay and CD budget for 32 nm technology node
Iessi, Umberto, Loi, Sara, Salerno, Antonio, Rigolli, Pierluigi, De Chiara, Elio, Turco, Catia, Colombo, Roberto, Polli, Marco, Mani, AntonioVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.772795
File:
PDF, 519 KB
english, 2008