SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Challenges of implementing contour modeling in 32nm technology
Fischer, Daniel, Allgair, John A., Raymond, Christopher J., Han, Geng, Oberschmidt, James, Cheng, Yong Wah, Maeng, Jae Yeol, Archie, Charles, Lu, Wei, Tabery, CyrusVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.775444
File:
PDF, 379 KB
english, 2008